Christoph Zaczek
18 - 23 May 2025
El Conquistador Tucson, A Hilton Resort
Tucson, Arizona USA
Events
Christoph Zaczek
Carl Zeiss SMT GmbH
The Smaller the BIGGER — EUV Lithography Optics, Where Size Meets Precision
In the first half of 2024, the world's first EUV scanner for the High Numerical Aperture (NA) lithography was delivered to a semiconductor manufacturer, enabling a resolution of 8 nm in chip production. The optics that enable such resolution consist of aspherical mirrors up to one meter in size and are manufactured in series with a precision of sub-100-picometer.
About the Speaker
Christoph Zaczek is Head of Architecture Process Development Optics at Carl Zeiss Semiconductor Manufacturing and has been a ZEISS Fellow since 2019. With over 25 years of experience in optics process technology, he designs and develops optics process architectures for lifetime-stable, high-precision lithography optics, covering all aspects from contouring to coating. He received his master’s degree in physics from Portland State University in 1995, his diploma from the University of Stuttgart in 1998 and his PhD from the University of Ulm in 2005. He has been with ZEISS since 1998.
